In this study, a new, relatively simple fabrication method for forming a mesoporous $Al(OH)_3$ film on Al substrates was demonstrated. This method, i.e., alkali surface modification, was simply comprised of dipping the substrate in a $5 imes10^{-3}$ M NaOH solution at $80^{circ}C$ for one minute and then immersing it in boiling water for 30 minutes. After alkali surface modification, a mesoporous $Al(OH)_3$ film was formed on the Al substrate, and its chemical state and crystal structure were confirmed by XPS and TEM. According to the results of the XPS analysis, the flake-like morphology after the alkali surface modification was mainly composed of $Al(OH)_3$, with a small amount of $Al_2O_3$. The mesoporous $Al(OH)_3$ layer was composed of three regions: an amorphousrich region, a region of mixed amorphous and crystal domains, and a crystalline-rich region near the $Al(OH)_3$ layer surface. It was confirmed that the stabilization process in the alkali surface modification strongly influenced the crystallization of the mesoporous $Al(OH)_3$ layer.