To assess the stress distribution of implant prosthesis induced by intentional misfit using photoelastic model. Stress was measured at the surrounding bone after applying vertical load to the implant. Three implants were placed in each of three photoelastic resin blocks. No misfits were used for the control group, while for the experimental group $100{mu}m$ misfit after cutting the crown was used. The photoelastic stress analysis was performed. In control group, stress concentration was not shown when the load was not applied, whereas stress concentration was shown only in the loaded part even when load was applied and the stress was distributed in anterior-posterior direction when applying a load in the middle. When intentional misfits were given, stress around the fixture was incurred when tightening the screw even if load was not applied. If the load was applied, stress was concentrated around the implants including areas where the load was applied. In particular, the prosthesis made of UCLA showed more stress concentration as compared with a conical abutment. In the UCLA case, concentration was shown from the apex following through the axis to the cervical area. Prosthesis with misfit makes the stress concentrated though the load was not applied and it induces even more severe stress concentration when the load was applied. This founding demonstrates the importance of the correct prosthesis production.