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자료유형
등재정보
발행기관
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Characteristics of Hafnium Silicate Films Deposited on Si by Atomic Layer Deposition Process
Lee. Jung-Chan, Kim. Kwang-Sook, Jeong. Seok-Won, Roh. Yong-Han 한국전기전자재료학회 Transactions on electrical and electronic materials 4 Pages
한국전기전자재료학회 Transactions on electrical and electronic materials 2011, Vol.12 No.3 127-130 (4 pages)


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