- 친자간의 두부 X선 규격사진상에 있어서의 유사성에 관한 연구
- THE STUDY ON THE CEPHALOMETRIC SIMILARITY BETWEEN PARENTS AND OFFSPRING
- ㆍ 저자명
- 강우곤,Kang. Wou Ghon
- ㆍ 간행물명
- 齒科放射線
- ㆍ 권/호정보
- 1975년|5권 1호|pp.11-21 (11 pages)
- ㆍ 발행정보
- 대한구강악안면방사선학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
The study was performed to investigate cephalomeric similarity between parents and offspring of the Korean family by lateral cephalometric analysis. The lateral cephalograms consist of the 8 families comprising 16 parents, 5 sons and 7 daughters. In order to make an investigation of the similarity, set up, and 22 linear measurements on each depth measurements were made. The author drew up the profilograms to compare parents with offspring in each family group. The obtained results were as follows: 12 measuring points were and height and 5 angular 1. There was no common similarity on specific region between parents and offspring on each family group. 2. There was partial similarity between single parent and offspring. 3. The partial similarity between single parent and offspring was noted on the upper face in general.