- 냉음극을 이용한 plasma전자 beam의 전기적 입력특성 II
- ㆍ 저자명
- 전춘생,김상현,이보호
- ㆍ 간행물명
- 전기학회지= The Processing of the Institute of Electrical Engineers
- ㆍ 권/호정보
- 1978년|27권 6호|pp.49-53 (5 pages)
- ㆍ 발행정보
- 대한전기학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
This paper investigates on the electric input characterisitcs of plasma electron beam in H$_{2}$ gas chamber with various pressures, effected by the shape and dimension of hollow screen cathode during electron beam is formed. The result are as follows: (1)Electron beam is formed in the region of positive resistance on the characteristic curve which shows the relation between the voltage and current of electron beam, independent of the shape and dimension of hollow screen cathode. (2)At a given electron beam current, electron beam voltage increases with the decreases of hollow screen cathode length and screen mesh number of it. (3)At a given electron beam current, electron beam voltage increases with the diameters of hollow screen cathode and electron beam hole of it.