The purpose of this experiment is to evaluate the noise dependency on the gate dimensions of the P-ch MOSFET which is fabricated of p+ sourse, drain, and gate electrode doped with PH$_3$ gas in type-N Si sudstrate. Experimental results indicate that: for the constant gate area and reletively thick films, noise level tends to decrease for the W/L ratio over unity, which generally conforms with theoretical observations, but its variation with the change in the thickness of film is less than the theoretically predicted for the W/L ratio below unity.