Hydrogen-permselective silica membranes were synthesized within tim walls of porous Vycor tubes by chemical vapor depostion of $SiO_2$. Film deposition was carried out using $SiCl_4$ hydrolysis either in the oppm shag reactants or in the one-sided geometry. At temperatures above $600^{circ}C$ the permeation rate of hydrogen thorough the silica films varied between 0.01 and $025cm^3(STP)/cm^2-min-atm$ depending on the reaction geometry and the $H_2 : N_2$ permeation ratio was about 1000. Permeation rates of both $H_2$ and $N_2$ increased with increasing temperature. The silica membranes produced by one-sided deposition have higher hydrogen permmeation rates than those produced by the opposing reactants geometry although the membranes formed in an opposing reactants geometry were relatively stable during the heat treatment or after exposure to ambient air. These membranes can be applied to high temperature gas separations or membrane reactors once the film deposition process is optimized to get high permeability as well as good stability.