This paper is studied about the method to measure the fine scratches on the mirror surfaces, such as the silicon wafer and magnetic memory disk by the optical measuring method. The theoretical background of this analysis is based upon the light scattering theory developed by Beckmann. In this analysis, the roughness in fine scratches is not considered because the aberage roughness is very small compared with the size of fine scratches. Empasis is on quantilaive method of fine scratches by non-contact method. Experiments are followed by the image processing system attached to the CCD Camera. As a results, I propose the new method to measure the size of the fine scratches from the parameters obtained by the computer simulation and experiments.