- Crack free 경질 크롬 도금욕 개발에 관한 연구
- ㆍ 저자명
- 추현식,이홍로
- ㆍ 간행물명
- 한국표면공학회지
- ㆍ 권/호정보
- 1992년|25권 4호|pp.181-186 (6 pages)
- ㆍ 발행정보
- 한국표면공학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
To investigate how to produce the crack free and chromium deposits, bath compositions, additives, electrolysis conditions and other electroplating parameters, such as cathodic current efficiency, surface hard-ness, crack density and corrosion rate of deposits were examined carefully. The crack free chrome deposits were well obtained using both wetting agents and two kind of additives. At 60 A/d$m^2$, $60^{circ}C$ electrolysis condition, crack free bright hard chromium deposits were well obtained to a thickness $300mu extrm{m}$ in Additive-I and Additive-II added solution.