$200{AA}$ thick Co/Pd multilayered thin films were fabricated by sputtering. Two thicknesses of cobalt sublayer, $2{AA}$ and $4{AA}$ were chosen and the effects of sputtering pressure on the perpendicular magnetic anisotropy were investigated. It has been found that the optimum pressure for maximum perpendicular magnetic anisotropy(PMA) existed and the pressure for maximum PMA was lower for the multilayer with $2{AA}$ cobalt layer than that with $4{AA}$ cobalt thickness. As the sputtering gas presssure increased, domain wall motion with magnetization became difficult and the predominant mode of magnetization reversal changed from domain wall motion to magnetic moment rotation. It turned out that the perpendicular magnetic anisotropy was higher in case of $2{AA}$ cobalt thickness than $4{AA}$ cobait thickness.