- 화화증착법에 의한 알루미나이드 코팅층의 형성
- Aluminide Coatings on IN713C by Chemical Vapor Depostion
- ㆍ 저자명
- 손희식,흥석호,김문일,Sohn. H.S.,Hong. S.H.,Kim. M.I.
- ㆍ 간행물명
- 열처리공학회지
- ㆍ 권/호정보
- 1994년|7권 2호|pp.129-138 (10 pages)
- ㆍ 발행정보
- 한국열처리공학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
The purpose of this study is to clarify the influence of the reaction temperature and $AlCl_3$ content on the aluminide coating formation on Ni-based superalloy IN713C in CVD process and to compare its throwing power with that of Pack Cementation process. Aluminide coating was formed by CVD in hot-wall stainless tube reactor from an $AlCl_3-H_2$ mixture in the temperature range $850{sim}1050^{circ}C$. At reaction temperature $850^{circ}C$, the coating thickness and the content of aluminium at the surface were increased as $AlCl_3$ heating temperature was raised. At reaction temperature $1050^{circ}C$, they were not influenced by the variation of $AlCl_3$ heating temperature. When $AlCl_3$ heating temperature was fixed $125^{circ}C$, the phases of the coatings were varied from $Ni_2Al_3$ to Al-rich NiAl and to Ni-rich NiAl with the reaction temperature. Therefore, in this study the reaction temperature has been found to be a major factor in determining the phase formed in CVD process. The throwing power of CVD was superior to that of Pack Cementation.