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화화증착법에 의한 알루미나이드 코팅층의 형성
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  • 화화증착법에 의한 알루미나이드 코팅층의 형성
  • Aluminide Coatings on IN713C by Chemical Vapor Depostion
저자명
손희식,흥석호,김문일,Sohn. H.S.,Hong. S.H.,Kim. M.I.
간행물명
열처리공학회지
권/호정보
1994년|7권 2호|pp.129-138 (10 pages)
발행정보
한국열처리공학회
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

The purpose of this study is to clarify the influence of the reaction temperature and $AlCl_3$ content on the aluminide coating formation on Ni-based superalloy IN713C in CVD process and to compare its throwing power with that of Pack Cementation process. Aluminide coating was formed by CVD in hot-wall stainless tube reactor from an $AlCl_3-H_2$ mixture in the temperature range $850{sim}1050^{circ}C$. At reaction temperature $850^{circ}C$, the coating thickness and the content of aluminium at the surface were increased as $AlCl_3$ heating temperature was raised. At reaction temperature $1050^{circ}C$, they were not influenced by the variation of $AlCl_3$ heating temperature. When $AlCl_3$ heating temperature was fixed $125^{circ}C$, the phases of the coatings were varied from $Ni_2Al_3$ to Al-rich NiAl and to Ni-rich NiAl with the reaction temperature. Therefore, in this study the reaction temperature has been found to be a major factor in determining the phase formed in CVD process. The throwing power of CVD was superior to that of Pack Cementation.