t-Butyl-3, 5-diaminobenzoate, containing t-butyloxycarbonyl(t-BOC) group, was synthesized. Then three polyamides containing t-BOC were prepared by condensation polymerization of t -butyl-3, 5-diaminobenzoate with three kinds of dichlorides such as isophthaloyl chloride, terephthaloyl chloride and suberoyl chloride. Then their photochemical property, thermal property, and solubility were examined. N-tosyloxyphthalimide was synthesized as a photoacid generator. The acid generating capability of N-tosyloxyphthalimide was investigated by a pH meter, UV spectrophotometer, and IR spectrophotometer. TGA thermowam was used to investigate whether p-toluenesulfonil acid, photochemically generated loom N-tosyloxyphthalimide, could remove f-butyl group of the polymers. Chemically amplified resists were prepared by mixing each polyamide and N-tosyloxyphthalimide. Their sensitivity and contrast were estimated from the change of normalized thickness remaining according to the amount of W irradiation. 0.5 W Positive Patterns were obtained using these chemically amplified resists.