With continued miniaturization and development of new devices, the highly nonuniform oxidation of three-dimensional non-planar silicon structures plays an increasingly important role. In this paper, the three-dimensional finite element numerical simulator. Grwoth of oxide is a coupled process of diffusion of oxidant and deformation of oxide. Because boundaries of oxide are moved in each time step and LOCOS structure is formed three-dimensional shape of sruface, it is necessary to develope an efficient node control algorithm that can locally generate and eliminate the node. Therefore we have developed the optimized three-dimensional mesh generator which is cpable of refining and eliminating the meshes at the moving boundary of oxide, and hve developed three-dimensional finite element oxidation solver.