Using trace etching method in this study, we measure the energy of argon ions generated in VEBA System which is composed of Marx Generater and Pulse Forming Line. In this system the electron beam of 240 kV, 30 kA, 60 ns is generated. Argon ions are formed through the electron beam ionization of a gas cloud injected by a fast puff valve. Thus argon ions are accelerated into vacuum drift tube by a virtual cathode and seperated with electron beam, consequently, they heat the trace etching plates made of aluminum thin films. The energy of argon ions are determined by the number of aluminum thin films penetrated by the ions. This experimental value corresponds with the theoretical value.