고분해도의 X-선 산란을 위해 두 실험 방법이 개발됐다. 그 방법들은 (1) 2-결정 회절 스펙트로메터 (DCD)설치와 (2) 3-결정 회절 스펙트로메터 (TCD) 설치였다. Si(511)-시료(hkl)의 DCD배열로 Si(333), Si(004), GaAs(004)의 rocking curve를 그렸다. 또한 단일체 단색 평행기와 $K_{alpha1}$ 선택기를 포함하는 Si(111)-Si(111)-Si(511)-sample(hkl)의 TCD배열로 Si(333), Si(004) 그리고 GaAs(004)의 rocking curve를 그렸다. DCD와 TCD에 의한 rocking curve의 FWHM의 차이가 논의됐다. DCD에 의한 $In_{0.037}Ga_{0.0963}As/GaAs$의 (004) 및 (115) 반사 토포그라프가 행해졌다.
Two experimental methods have been developed for high resolution measurement of x-ray scattering. The methods used were (1) an x-ray double crystal diffraction (DCD) spectrometer set-up and (2) an x-ray triple crystal diffraction (TCD) spectrometer set-up. With the DCD arrangement of Si(511)-sample(hkl), rocking curves have been plotted for Si (333), Si(004) and GaAs(004). Also, with the TCD arrangement of Si(111)-Si(111)-Si(511)-sample(hkl) including monolithic monocro-collimator and $K_{alpha1}$ selector, rocking curves have been plotted for Si(333), Si(004) and GaAs(004). The results of FWHM by DCD and TCD set-up have been compared each other and discussed. The reflection topographs (004) and (115) in an $In_{0.037}Ga_{0.0963}As/GaAs$ sample have been obtained by DCD set-up.
