To enhance the resolution and the depth of focus of the patterns whose size reaches the optical resolution limits, the various imaging methods are being tried. Generally in the linear polarization illumination methods, the contrast gap exists between TE mode TM mode according to the pattern direction. However, through the previous research, the elliptical polarization illumination(EPI) method was proposed to overcome this contrast gap. In this research, we investigated the optimal polarization condition to be able to enhance the depth of focus(DOF) for the optional mask which is containing the opposite direction patterns by applying the various polarization conditions including EPI. The DOF according to each polarization condition was obtained by ED-Tree(Exposure-Defocus Tree) for the given exposure dose and CD error boundaries. As the result, we can ascertain th effect of EPI for the enhancement of DOF in some condition of optical system.