- 레이저 에블레이션법으로 제작된 PLZT 박막의 구조 및 전기적 특성에 관한 연구
- ㆍ 저자명
- 장낙원,마석범,백동수,최형,박창엽
- ㆍ 간행물명
- 전기전자재료학회논문지
- ㆍ 권/호정보
- 1998년|11권 10호|pp.866-870 (5 pages)
- ㆍ 발행정보
- 한국전기전자재료학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
PLZT thin films were fabricated with different Zr/Ti ratios by pulsed laser deposition. PLZT films deposited on Pt/Ti/SiO$_2$/Si substrate. This PLZT thin films of 5000$AA$ thickness were crystallized at $600^{circ}C$, $O_2$ pressure 200m Torr. 2/55/45 PLZT thin film showed a maximum dielectric constant value of $varepsilon$ulcorner=1550 and dielectric loss was 0.03 at 10kHz. At 2/70/30 PLZT thin film, coercive field and remnant polarization was respectively 19[kV/cm], 8[$mu$C/$ extrm{cm}^2$]. Raman spectroscopy results showed that the bands of spectra became broader as the amount of Zr mol% increased and two crystal phase coexisted at 2/55/45 PLZT film. Raman spectroscopy was useful for crystal structure analysis of PLZT thin films.