Relationships between LPMOCVD deposition parameters and the photocatalytic characteristics of TiO2 films was investigated. Metal organic precursor use for preparing TiO2 films was TTIP(Titanium tetraisopropoxide). Depositions were carried out at 400-$600^{circ}C$ and crystalline phase was anatase. As-deposited anatase phase was converted into rutile after annealing at 80$0^{circ}C$ for 24hrs in the air. Films deposited at 40$0^{circ}C$ had smooth surface and smaller photocatalytic efficiency than those of films deposited at 50$0^{circ}C$ and $600^{circ}C$ which had rougher surface. Because the adsorption of phenol on the TiO2 film surfaces could be the bottleneck process in case of film type photocatalyst. It was concluded that the inital concentration of phenol roughness of films and crystalline phase could have effects on the photocatalytic efficiency via alternating specific area of films. It was observed that photocatalytic efficiency of TiO2 films similar to that of powder forms apparently decreased when pH of solution increased