본 실험에서는 리튬 이차 박막전지의 음극물질로 주석 산화물 박막을 RF magnetron sputter을 이용하여 증착하였다. RF power와 공정 압력을 각각 $2.5W/cm^2$와 10mTorr로 고정시키고 박막 중의 산소량을 조절하기 위해 산소 분압을 $0~100\%$까지 조절하여 실험하였으며, 산소량을 더 줄이기 위해 주석 금속 칩을 사용하여 조절하였다. 산소량을 줄여 줌으로써 비가역적으로 형성되는 리튬산화물의 량을 줄이고 고용량의 $SnO_x$음극 박막을 제조하였다. 그 중 $SnO_{1.43}$일 때 가장 큰 가역용량(약$ 500{mu}Ah/cm^2{mu}m$) 얻었다.
In this experiments, tin oxide thin film anode for microbattery was deposited by using RF magnetron sputtering. The RF power and operating pressure during deposition were fixed at $2.5W/cm^2$ and 10mTorr respectively. The partial pressure of oxygen was varied from $0\%;to;100\%$ to control oxygen content and metal Sn chips were used further reducing of oxygen content. According to reduction in the oxygen content formation of the irreversible $Li_2O$ was reduced a thin film anode of $SnO_x$ of high capacity was fabricated. The optimum $SnO_x$, thin film was $SnO_{1.43}$ which exhibited a reversible capacity of $ 500{mu}Ah/cm^2{mu}m$ and exhibited good reversibility.
