As IR-sensor for detecting pollution material, the iron silicide has a fit band gap, high physicochemical stability at high temperature and good acid resistance. The growing film was formed with the Fe-Si bond and the organic compound because plasma resolved the injected precursors into various active species. In the Raman scattering spectrum, the Fe-Si vibration mode showed at 250 {TEX}$cm^{-1}${/TEX}. The FT-IR peak indicated that the various organic compounds were deposited on the films. The iron silicide was epitaxially grown to β-phase by the high energy of plasma. The lattice structure of films had [220]/[202] and [115]. The thickness of the films increased with the flow rate of silane. But rf-power increased with decreasing the thickness. The optical gap energy and the band gap were shown about 3.8 eV and 1.182∼1.194 eV. The band gap linearly increased and the formula was below: {TEX}$E_g^{dir}${/TEX}= 8.611×{TEX}$10^{-3}N_{D}${/TEX}＋1.1775