We have studied the field emission characteristics of multi-layered diamond-like-carbon (DLC) films deposited by vertical electrodes type plasma enhanced chemical vapor deposition with CH$_4$ and H$_2$ mixture. We deposited a thin layer of DLC on the p$^{+}$-Si substrate and then turned off plasma before another deposition of a new DLC layer. The thickness and the number of DLC layers are varied. The emission characteristics of multi-layered DLC films were compared with conventional one. The multi-layered DLC film shows higher emission current than conventional one.e.