Designing high quality products and processes at a low cost is central technological and economic challenge to the engineer. The combination of engineering concepts and statistical implementations offered by Taguchi`s off-line design technique has proven t be invaluable. By examining some deficiencies in designs from the Taguchi`s highly fractional, orthogonal main effect plan based on orthogonal arrays, alternative method is proposed. The maximum resolution or the minimum aberration criterion is commonly used for selecting 2$^{n-m}$ fractional designs. We present new high resolution (low aberration) linear graphs to simplify the complexity of selecting designs with desirable statistical properties. The new linear graphs approach shows a substantial improvement over Taguchi`s linear graphs and other related graphical methods for planning experiment. The new set of linear graphs will allow the experimenter to maintain the simple approach suggested by Taguchi while obtaining the best statistical properties of the resulting design such as minimum aberration as a by-product without dependency on complicated computational algorithm or additional statistical training.g.