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Synthesis of Newel Positive Type Photosensitive Polyimide
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취소
  • Synthesis of Newel Positive Type Photosensitive Polyimide
  • Synthesis of Newel Positive Type Photosensitive Polyimide
저자명
Ahn. Byung-Hyun,Lee. Dae-Woo,Lee. Jin-Kook
간행물명
Korea Polymer Journal
권/호정보
2001년|9권 5호|pp.247-252 (6 pages)
발행정보
한국고분자학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
서지반출

기타언어초록

Tricyclic aliphatic dianhydride monomer, tricycle[4.2.2.0]dec-9-ene exo, endo-3,4: 7,8-tetra-carboxylicdianhydride (TCDDA), was synthesized by photochemical reaction and poly(amic acid)s from TCDDA and diamines such as 1,4-bis-(4-aminophenoxy)benzene (BAB), 2,2-bis(4-(4-aminophenoxy) phenyl) propane (BAPP), 2,2-bis(4-(4-aminophenoxy)phenyl)hexafluoropropane (BAPHF), bis(4-(4-ami-nophenoxy) phenyl)sulfone (BAPS), and 1,4-bis-(4-aminophenoxy)biphenyl (BABP) were prepared. The inherent viscosities of the poly(amic acid)s were between 0.39 and 0.50 dL/g. The poly(amic acid)s were converted to polyimide films by thermal imidization. The glass transition temperatures (T$\_$g/) of the polyimides were in the range of 201-263$^{C}$. The thermogravimetric analysis (TGA) thermogram of these polyimides showed the temperatures of 5% weight losses between 375 and 393$^{C}$ in nitrogen atmosphere. To show their utility for image generation, degradations of these polyimides in UV exposure were investigated by UV spectroscopy.