- 고정입자패드를 이용한 사출금형의 나노 폴리싱에 관한 연구
- ㆍ 저자명
- 최재영,김호윤,박재홍,정해도,서헌덕,Choe. Jae-Yeong,Kim. Ho-Yun,Park. Jae-Hong,Jeong. Hae-Do,Seo. Heon-Deok
- ㆍ 간행물명
- 한국정밀공학회지
- ㆍ 권/호정보
- 2002년|19권 10호|pp.212-220 (9 pages)
- ㆍ 발행정보
- 한국정밀공학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
The finishing process for die and mold manufacturing is very important because it influences the final quality of products. Injection molds need higher quality surface than general purpose dies and molds. Conventional polishing can not make mold surface down to nanometer roughness efficiently because of their loading and glazing. This paper focused on the development of fixed abrasive pad using water swelling mechanism of polymer binder network. Self-conditioning was recognized as the long term polishing stabilization tool without any loading or glazing because water makes fixed abrasives free by swelling of the pad. Consequently, stable nano-polishing process has been applied on the injection mold, from the experimental results with polished surface roughness of Ra 15.1nm on STD-11 die steel.