The statistical experiment method is employed to optimize the deposition condition of Co film with DC magnetron sputtering process. The statistical treatment results showed the significance value below 0.05, low RMS error and R-sq value close to 1, which implied that our experiment and design were very reliable. We found that the sheet resistance decreased to -1.83Ω/$square$ with the deposition temperature, increased to 11.17Ω/$square$ with the deposition pressure, and decreased into -0.65Ω/$square$ with the DC power. We also confirmed that the sheet resistance uniformity was mainly influenced by the deposition temperature as it decreased -4.04％ at the temperature range of 25$^{C}$∼147$^{C}$. Finally, we report that the optimum condition of Co film using our statistical method of design of experiment is the deposition temperature of 25$^{C}$, the deposition pressure of 12mTorr, and the DC power of 1500W.