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Micromachining of Cr Thin Film and Glass Using an Ultrashort Pulsed Laser
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  • Micromachining of Cr Thin Film and Glass Using an Ultrashort Pulsed Laser
  • Micromachining of Cr Thin Film and Glass Using an Ultrashort Pulsed Laser
저자명
Choi. Ji-Yeon,Kim. Jae-Gu,Shin. Bo-Sung,Whang. Kyung-Hyun
간행물명
Journal of the Optical Society of Korea
권/호정보
2003년|7권 3호|pp.160-164 (5 pages)
발행정보
한국광학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

Materials processing by ultrashort pulsed laser is actively being applied to micromachining technology due to its advantages with regard to non-thermal machining. In this study, materials processing with ultrashort pulses was studied by using the high repetition rate of a 800 nm Ti:sapphire regenerative amplifier. This revealed that the highly precise micromachining of metallic thin film and bulk glass with a minimal heat affected zone (HAZ) could be obtained by using near damage threshold energy. Grooves with diffraction limited sub-micrometer width were obtained with widths of 620 nm on Cr thin film and 800 nm on a soda-lime glass substrate. The machined patterns were investigated through SEM images. We also phenomenologically examined the influence of variations of parameters and proposed the optimal process conditions for microfabrication.