- 마스크 뒷면에 2 위상 회절 격자를 구현한 변형 조명 방법
- ㆍ 저자명
- 이재철,오용호,고춘수
- ㆍ 간행물명
- 전기전자재료학회논문지
- ㆍ 권/호정보
- 2004년|17권 7호|pp.697-700 (4 pages)
- ㆍ 발행정보
- 한국전기전자재료학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
We propose a method that realizes the modified illumination by implementing a binary phase grating at the backside of a photomask. By modeling the relationship between the shape of a grating on the photomask and the light intensity at the pupil plane, we developed a program named MIDAS that finds the optimum grating pattern with a stochastic approach. After applying the program to several examples, we found that the program finds the grating pattern for the modified illumination that we want. By applying the grating at the backside of a photomask, the light efficiency of modified illumination may be improved.