Impedance matching characteristics of planar type inductively coupled plasma sources are investigated utilizing the previously reported two-dimensional theory[1] of the anomalous skin effect. Two types of matching networks are considered, and the values of the circuit elements are expressed as functions of various reactor parameter. Also, two cases of perfect and imperfect matching conditions are considered and the functional dependence of the values of matching capacitance and reflection coefficient on the various reactor parameters are investigated using the present circuit model.