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Pulsed Electrochemical Deposition for 3D Micro Structuring
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  • Pulsed Electrochemical Deposition for 3D Micro Structuring
  • Pulsed Electrochemical Deposition for 3D Micro Structuring
저자명
Park. Jung-Woo,Ryu. Shi-Hyoung,Chu. Chong-Nam
간행물명
International journal of precision engineering and manufacturing
권/호정보
2005년|6권 4호|pp.49-54 (6 pages)
발행정보
한국정밀공학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

In this paper, micro structuring technique using localized electrochemical deposition (LECD) with ultra short pulses was investigated. Electric field in electrochemical cell was localized near the tool tip end region by applying pulses of a few hundreds of nano second duration, Pt-Ir tip was used as a counter electrode and copper was deposited on the copper substrate in mixed electrolyte of 0.5 M $CuSO_4$ and 0.5 M $H_2SO_4$, The effectiveness of this technique was verified by comparison with ECD using DC voltage. The deposition characteristics such as size, shape, surface, and structural density according to applied voltage and pulse duration were investigated. The proper condition was selected based on the results of the various experiments. Micro columns less than $10{mu}m$ in diameter were fabricated using this technique. The real 3D micro structures such as micro spring and micro pattern were made by the presented method.