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Submicron-scale Polymeric Patterns for Tribological Application in MEMS/NEMS
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  • Submicron-scale Polymeric Patterns for Tribological Application in MEMS/NEMS
  • Submicron-scale Polymeric Patterns for Tribological Application in MEMS/NEMS
저자명
Singh. R. Arvind,Yoon. Eui-Sung,Kim. Hong Joon,Kong. Hosung,Jeong. Hoon Eui,Suh. Kahp Y.
간행물명
KSTLE international journal
권/호정보
2005년|6권 2호|pp.33-38 (6 pages)
발행정보
한국윤활학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

Submicron-scale patterns made of polymethyl methacrylate (PMMA) were fabricated on silicon-wafer using a capillarity-directed soft lithographic technique. Polyurethane acrylate (PUA) stamps (Master molds) were used to fabricate the patterns. Patterns with three different aspect ratios were fabricated by varying the holding time. The patterns fabricated were the negative replica of the master mold. The patterns so obtained were investigated for their adhesion and friction properties at nano-scale using AFM. Friction tests were conducted in the range of 0-80 nN. Glass (Borosilicate) balls of diameter 1.25 mm mounted on cantilever (Contact Mode type NPS) were used as tips. Further, micro-friction tests were performed using a ball-on-flat type micro-tribe tester, under reciprocating motion, using a soda lime ball (1 mm diameter) under a normal load of 3,000 mN. All experiments were conducted at ambient temperature ($24{pm}1^{circ}C$) and relative humidity ($45{pm}5\%$). Results showed that the patterned samples exhibited superior tribological properties when compared to the silicon wafer and non-patterned sample (PMMA thin film) both at the nano and micro-scales, owing to their increased hydrophobicity and reduced real area of contact. In the case of patterns it was observed that their morphology (shape factor and size factor) was decisive in defining the real area of contact.