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저자명
이학정,권영숙,장정대,이상준,조현혹,Lee. Hack-Jung,Kwon. Young-Suk,Jang. Jeong-Dae,Lee. Sang-Joon,Cho. Hyun-Hok
간행물명
韓國染色加工學會誌
권/호정보
2006년|18권 6호|pp.37-42 (6 pages)
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한국염색가공학회
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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Researches to preserve and restore the remaining fabrics as costume heritages have been carried out. In this study, in order to artificially restore an excavated silk fabrics, degummed silk fabrics and safflower dyed silk fabrics were prepared for an experiment. These fabrics were photo-degraded by the Xenon arc beam to have various strength retention(100%, 80%, 60%, 40%, 20%). The fine structure and physical properties of Xenon arc treated fabrics were investigated with various techniques such as tensile test, weight loss, wide-angle X-ray diffraction, yellowness, color, SEM etc. Tensile strength and the crystal diffraction intensity of silk fabrics decreased as Xenon arc hem treatment time increased. Weight loss increased slightly. Strength retention was decreased as the Xenon arc beam treatment time goes by. (Yellowness of the undyed silk fabrics and $L^*$ of the dyed silk fabrics increased. Whiteness of the undyed silk fabrics and $b^* of the dyed silk fabrics decreased.) SEM results of the silk fabrics treated Xenon arc beam show that surface was a little damaged.