The effective fracture toughness testing of materials intended for application in Micro Electro Mechanical Systems (MEMS) devices is required in order to improve understanding of how micro sized material used in device may be expected to perform upon the micro scale. ${gamma}$-TiAl based materials are being considered for application in MEMS devices at elevated temperatures. Especially, in Alloy 4, both ${alpha}_2$ and ${gamma}$ lamellae were altered markedly in 3,000 h, $700^{circ}C$ exposure. Parallel decomposition of coarse ${alpha}_2$ into bunches of very fine (${alpha}_2+{gamma}$) lamellae. Parallel decomposition of coarse ${alpha}_2$ into bunches of very fine (${alpha}_2+{gamma}$) lamellae. The materials were examined 2 types Alloy 4 on heat exposed specimen($700^{circ}C$, 3,000 h) and no heat exposed one. Micro sized cantilever beams were prepared mechanical polishing on both side at $25{sim}30{mu}m$ and electro final stage polishing to observe lamellar orientation of same colony with EBSD (Electron Backscatter Diffraction Pattern). Through lamellar orientation as inter-lamellae or trans-lamellae, Cantilever beam was fabricated with Focused Ion Beam(FIB). The directional behavior of the lamellar structure was important property in single material, because of the effects of the different processing method and variations in properties according to lamellar orientation. In MEMS application, it is first necessary to have a reliable understanding of the manufacturing methods to be used to produce micro structure.