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High Performance Wilkinson Power Divider Using Integrated Passive Technology on SI-GaAs Substrate
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  • High Performance Wilkinson Power Divider Using Integrated Passive Technology on SI-GaAs Substrate
  • High Performance Wilkinson Power Divider Using Integrated Passive Technology on SI-GaAs Substrate
저자명
Wang. Cong,Qian. Cheng,Li. De-Zhong,Huang. Wen-Cheng,Kim. Nam-Young
간행물명
Journal of the Korean Institute of Electromagnetic Engineering and Science
권/호정보
2008년|8권 3호|pp.129-133 (5 pages)
발행정보
한국전자파학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
서지반출

기타언어초록

An integrated passive device(IPD) technology by semi-insulating(SI)-GaAs-based fabrication has been developed to meet the ever increasing needs of size and cost reduction in wireless applications. This technology includes reliable NiCr thin film resistor, thick plated Cu/Au metal process to reduce resistive loss, high breakdown voltage metal-insulator-metal(MIM) capacitor due to a thinner dielectric thickness, lowest parasitic effect by multi air-bridged metal layers, air-bridges for inductor underpass and capacitor pick-up, and low chip cost by only 6 process layers. This paper presents the Wilkinson power divider with excellent performance for digital cellular system(DCS). The insertion loss of this power divider is - 0.43 dB and the port isolation greater than - 22 dB over the entire band. Return loss in input and output ports are - 23.4 dB and - 25.4 dB, respectively. The Wilkinson power divider based on SI-GaAs substrates is designed within die size of $1.42;mm^2$.