Photoreactive polymers as a color filter resist containing both photoreactive acrylate and cinnamate double bonds were synthesized usin two step reactions. The chemical structures of the synthesized polymers were confirmed by $^1H$-NMR and FT-IR spectroscopy. The photoreactive polymers were quite soluble in most common organic solvents and produced excellent quality thin films by spin-coating. The photocuring kinetics of the acrylate and cinnamate double bonds were examined by FT-IR and UV- Vis spectroscopy, which confirmed the excellent photoreactivity of both the acrylate and cinnamate double bonds in the polymers. Upon UV irradiation, photocuring was almost completed within approximately 5 min, irrespective of the type of the prepolymers. The polymers also exhibited superior thermal stability, showing little change in transmittance in the visible region even after heating to $250^{circ}C$ for one hour. Photolithographic micropatterns could be obtained with a resolution of a few microns.