- B, Al, Ga, In의 도핑물질이 투명 전도성 ZnO 박막의 특성에 미치는 영향
- ㆍ 저자명
- 노영우,조종래,손세모,정수태,No. Young-Woo,Cho. Jong-Rae,Son. Se-Mo,Chung. Su-Tae
- ㆍ 간행물명
- 전기전자재료학회논문지
- ㆍ 권/호정보
- 2008년|21권 3호|pp.242-248 (7 pages)
- ㆍ 발행정보
- 한국전기전자재료학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
The structural, optical and electrical properties of ZnO films doped with 1.5 at% of 3A materials(B, Al, Ga, In) were studied by sol-gel process. The films were found to be c-axis (002) oriented hexagonal structure on glass substrate, when post heated at 500 $^{circ}C$. The surface of the films showed a uniform and nano size microstructure and the crystalline size of doped films decreased. The lattice constants of ZnO:B/Al/Ga increased than that of ZnO, while ZnO:In decreased. All the films were highly transparent(above 90 %) in the visible region. The energy gaps of ZnO:B/Al/Ga were increased a little, but that of ZnO:In was not changed. The resistivities of ZnO:Al/Ga/In were less than 0.1 $Omega$cm. All the films showed a semiconductor properties in the light or temperature, however ZnO:In was less sensitive to it. A figure of merit of ZnO:In had the highest value of 0.025 $Omega^{-1}$ in all samples.