Minimization of processing time in two-photon stereolithography (TPS) has been one of important issues. Generally, a voxel scanning method (VSM) has been used in TPS because the method is very profitable for the stable fabrication irrespective of jittering and response time of scanning equipments such as a stage and a galvano-scanner. However, supplementary processing time due to the on/off control of a shutter for the generation of each voxel is required inevitably in VSM; by this reason, much processing time takes to fabricate largescale micropatterns and three-dimensional patterns. In this work, a continuous scanning method (CSM), generating patterns by movement of beam focus with a constant speed, is proposed for the improvements of scanning speed and precision in TPS. Some line patterns are fabricated by each scanning method to demonstrate the usefulness of CSM with viewpoints of scanning speed and precision.