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AAO 나노기공을 나노 임프린트 리소그래피의 형틀로 이용한 PMMA 나노패턴 형성 기술
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  • AAO 나노기공을 나노 임프린트 리소그래피의 형틀로 이용한 PMMA 나노패턴 형성 기술
저자명
이병욱,홍진수,김창교,Lee. Byoung-Wook,Hong. Chin-Soo,Kim. Chang-Kyo
간행물명
제어·로봇·시스템학회 논문지
권/호정보
2008년|14권 5호|pp.420-425 (6 pages)
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제어로봇시스템학회
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

PMMA light guiding plate with nano-sized pattern was fabricated using anodized aluminum oxide membrane as a template for nano imprint lithography. Nano-sized pore arrays were prepared by the self-organization processes of the anodic oxidation using the aluminum plate with 99.999% purity. Since the aluminum plate has a rough surface, the aluminum plate with thickness of 1mm was anodized after the pre-treatments of chemical polishing, and electrochemical polishing. The surface morphology of the alumina obtained by the first anodization process was controlled by the concentration of electrochemical solution during the first anodization. The surface morphology of the alumina was also changed according to temperature of the solution during chemical polishing performed after first anodization. The pore widening process was employed for obtaining the one-channel with flat surface and height of the channel because the pores of the alumina membrane prepared by the fixed voltage method shows the structure of two-channel with rough surface. It is shown from SPM results that the nano-sized pattern on PMMA light guiding plate fabricated by nano imprint lithography method was well transferred from that of anodized aluminum oxide template.