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Intrinsic stress, mismatch strain, and self-assembly during deposition of thin films subjected to an externally applied force
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  • Intrinsic stress, mismatch strain, and self-assembly during deposition of thin films subjected to an externally applied force
  • Intrinsic stress, mismatch strain, and self-assembly during deposition of thin films subjected to an externally applied force
저자명
Kim. Sang-Hyun,Boyd IV. James G.
간행물명
Journal of mechanical science and technology
권/호정보
2008년|22권 11호|pp.2048-2055 (8 pages)
발행정보
대한기계학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

A relation is derived between the mismatch strain, the film thickness, and the displacement of a linear elastic structure under external loading during material deposition. If any two of these variables can be experimentally determined, then the remaining variable can be determined. The method allows one to experimentally determine the mismatch strain by measuring the film thickness and the displacement of a point on the structure that is not undergoing deposition. The intrinsic stresses can be used to self-assemble microstructures during material deposition. Assembly of two components is considered: one component is subjected to deposition and is modeled as an Euler-Bernoulli beam, and the other component is not subjected to deposition and is modeled as a linear spring. For the purposes of this paper, the definition of assembly requires that the beam do work on the spring. The analysis is experimentally verified by electroplating nickel onto an AFM cantilever beam in contact with a second AFM beam (serving as the spring) that does not undergo deposition.