The conductive coating method is used for various industrial fields. For example, the sputtering process is used to coat the ITO layer in LCD or OLED panel manufacturing process and fabricate a base layer of substrate of an electric printing device. However, conventional coating processes (beam sputtering, spin coating etc.) have problems in the industrial manufacturing process. These processes have a very high cost and critical manufacturing environment as a vacuum process. Recently, many researchers have proposed various printing processes instead of conventional coating processes. We propose an ESD printing process in ITO coating layer and apply to fabricate a conductive coating film. Furthermore, the effect of the nozzle and also the applied voltage on different configurations of the nozzle head was also studied for better understanding of the electro static deposition process.