Meta-aramid films were photooxidized by UV/ozone irradiation. Reflectance of the irradiated films decreased in the low wavelength regions of visible light, indicating destructive interference of visible light due to roughened surface. The UV treatment developed the nano-scale roughness on the meta-aramid films surface, which increased by two-fold from 236.5 to 408.9 nm in terms of peak-valley roughness. The UV irradiation caused the oxygen content of the meta-aramid film surface to increase. Water contact angle decreased from 49.8 to $29.9^{circ}$ and surface energy increased from 82.7 to 106.4 mN/m with increasing UV energy. The surface energy change was attributed to significant contribution of polar component rather than nonpolar component indicating surface photooxidation of meta-aramid films. The increased dyeability to cationic dyes may be due to photochemically introduced anionic and dipolar dyeing sites on the film surfaces.