Advanced oxidation processes (AOPs) have advantages to reduce the processing time and mineralize contaminants dissolved in groundwater. Recently, remediation techniques for organic contamination in groundwater have been studied, and technology using $UV/H_2O_2$ is generally accepted as one of the most powerful and reliable alternative for the remediation of groundwater contamination. In this study, $UV/H_2O_2$ technology, which generates hydroxyl radical ($cdot$ OH) as known for strong non-selective oxidant, was used to degrade chlorinated solvents (TCE and PCE), and it was expanded to apply continuous stirred tank reactor (CSTR) system (i.e. combinations of three CSTR). The tested parameters for CSTR system were retention time and groundwater/$H_2O_2$ injection volume ratio. To find optimum parameters for CSTR system, various retention time (6 min ~ 90 min) and groundwater/$H_2O_2$ injection volume ratio (5/1 ~ 119/1) were tested. Other conditions for CSTR were adapted from the batch test results, which concentration of $H_2O_2$ and UV dose were 29.4 mM (0.1%) and 4.3 kWh/L, respectively. Based on the experimental results, the optimum parameters for CSTR system were 20 min for retention time and 119/1 for groundwater/$H_2O_2$ injection volume ratio. Applying these optimum conditions, chlorinated solvents (TCE and PCE) were removed at 99.9% and 99.6%. Moreover, the effluent concentrations of TCE and PCE are 0.036 mg/L and 0.087 mg/L, respectively, which are satisfied the regulatory level (TCE 0.3 mg/L, PCE 0.1 mg/L). Consequently, the CSTR system using $UV/H_2O_2$ technology can achieve high removal efficiency in the event of treatment of groundwater contaminated by chlorinated solvents (TCE and PCE).