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Planarization of flexible tape substrate by solution coating process
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  • Planarization of flexible tape substrate by solution coating process
  • Planarization of flexible tape substrate by solution coating process
저자명
Kang. Boo-Min,Ko. Rock-Kil,Kim. Dong-Hyuk,Ha. Dong-Woo,Park. Seong-Soo
간행물명
한국초전도·저온공학회논문지
권/호정보
2011년|13권 4호|pp.18-21 (4 pages)
발행정보
한국초전도저온공학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

In this work, the yttrium oxide($Y_2O_3$) thin films as the buffer layer were prepared by the simple solution coating and reel-to-reel process on an unpolished metal tape substrate. The $Y_2O_3$ thin films were successfully synthesized by the hydrolysis of yttrium acetate. We have studied the improvement of surface roughness with the concentration of solution(0.1 M, 0.4 M, M) and the number of coatings. The planarization by solution coating process is simple in comparison with the existing polishing process, and it is eco-friendly, and has the benefits of low cost process. The thickness of $Y_2O_3$ films was increased with the $Y_2O_3$ concentration in the solution, and the surface became smoother with the number of coating cycles. Using this process, we have achieved 1.2 nm RMS roughness from a starting roughness of over 31 nm on 25 ${mu}m^2$ area.