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Deposition of Super Hydrophobic a-C:F Films by Dielectric Barrier Discharge at Atmospheric Pressure
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  • Deposition of Super Hydrophobic a-C:F Films by Dielectric Barrier Discharge at Atmospheric Pressure
  • Deposition of Super Hydrophobic a-C:F Films by Dielectric Barrier Discharge at Atmospheric Pressure
저자명
Kim. Duk-Jae,Kim. Yoon-Kee,Han. Jeon-Geon
간행물명
한국표면공학회지
권/호정보
2011년|44권 2호|pp.50-54 (5 pages)
발행정보
한국표면공학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

Hydrophobic a-C:F film was coated on polycarbonate film with $CF_4$, $C_2F_6$ and HFC ($C_2F_4H_2$) gas in helium discharge generated by 5~100 kHz AC power supply at atmospheric pressure and room temperature. The highest water contact angle of the a-C:F film formed with $He/C_2F_6$ mixed gas is $155^{circ}$. X-ray photoelectron spectrum showed that there was 40% of C-$CF_3$ bond at the surface of the super hydrophobic film. The contact angle and deposition rate were decreased with increasing substrate temperature. The contact angle was generally increased with the surface roughness of the film. The contact angle was high when the surface microstructure of the film was fine and sharp at the similar roughness and chemical composition of the surface.