In this work, a design of transparent conductive oxide less electrochemical luminescence (TCO-less ECL) cell has been proposed using a Ti metal layer as the secondary electrode. Ti metal films (~500 nm in thickness) are deposited on a glass substrate without Fluorine-doped $SnO_2$ (FTO) by RF magnetron sputtering. The TCO-less ECL cell is composed of a glass substrate/Ti metal/porous $TiO_2$/Ru(II) complex/counter electrode. The Ti metal layer with high conductivity can collect electrons from the $TiO_2$ layer and prevent electrons from back-transferring from the Ti to the electrolyte. The vacuum annealing treatment is important to ensure solid interconnections of porous $TiO_2$ with underlying Ti metal layers. The ECL efficiency of the TCO-less cell consisting of the layer of Ti and porous $TiO_2$ was ~290 cd/$m^2$, much higher than the efficiency (125 $cd/m^2$) of general cell with FTO glass/Ru(II) complex in propylene carbonate/counter electrode configuration.