This paper presents a position error recognition system when the wafer is mounted in cleaning equipment among the wafer manufacturing processes. The proposed system is to enhance the performance in cost and reliability by preventing the wafer cleaning system from damaging by alerting it when it is put in correct position. The proposed algorithm is in obtaining a mapping function from camera and physical wafer by designing and manufacturing the radial shape calibrator to reduce the error by using the conventional chess board one. The system is to install in-line process using high reliable and high accurate position recognition. The experimental results show that the performance of the proposed system is better than that of the existing method for detecting errors within tolerance.