Perfluorocarbons (PFCs) have been adopted for plasma etching and chemical vapor deposition process in semiconductor manufacturing. Among the other exhaust gases, PFCs have longer residual time in air and higher global wanning potential To remove PFCs, water jet gliding arc plasma was designed and prepared. Water jet gliding arc plasma has received the attention as a PFCs decomposition technique due to the formation of OH radical and wide range of plasma. Using water jet gliding arc plasma, the efficacy on the decomposition of $CF_4$, one of the major PFCs, was evaluated. As the results of experiments, the amount of water jet increases the decomposition efficiency of $CF_4$. From the experimental results, a combination of plasma and water jet is considered to be effective for the decomposition of $CF_4$. Regarding the parametric researches, input feed of water jet, input concentration change, variation in input power, electrode gap, and electrode length were selected for experiments. The highest decomposition efficiency of $CF_4$ was achieved with 2.1% of input concentration, 7200 kJ/$m^3$ of specific energy input (SEI), $1.53{ imes}10^{-4};m^3/s$ of total gas amount, and $4.25{ imes}10^{-7};m^3/s$ of water jet feed.