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On the wear mechanism of thin nickel film during AFM-based scratching process using molecular dynamics
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  • On the wear mechanism of thin nickel film during AFM-based scratching process using molecular dynamics
  • On the wear mechanism of thin nickel film during AFM-based scratching process using molecular dynamics
저자명
Khan. Hanif Muhammad,Kim. Sung-Gaun
간행물명
Journal of mechanical science and technology
권/호정보
2011년|25권 8호|pp.2111-2120 (10 pages)
발행정보
대한기계학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

We report a study on monocrystalline nickel thin films using the atomic force microscope (AFM) based scratching process to understand the associated wear mechanism. As for the nano level fabrication, better understanding of abrasive wear mechanism is a prerequisite. A three-dimensional molecular dynamics (MD) study has been performed and we have used a new parameter wear volume to distinguish between different wear zones. A reduced number of zones have been proposed to understand the wear mechanism during nanoscratching process. Also, centrosymmetry parameter has been used to validate the findings.