Corrosion resistance and basic physical properties of solid tantalum are not comparable to most of the structural metallic materials. The relative high cost and melting temperature of tantalum are obstacles to be widely applied to general engineering processes. Electrodeposition in molten salt enables compact and uniform tantalum coating. In this study, Ta was coated onto base metal (SUS316L) with different current densities (0.5, 5, $20mA/cm^2$) by using MSE (Molten Salt Electrodeposition). In this study, it showed that deposition efficiency and microstructure of Ta coating layer were strongly depended on current density. In the case of the current density of $5mA/cm^2$, densest microstructure was obtained. The current density above $5mA/cm^2$ caused non-uniform microstructure due to rapid deposition rate. Dense microstructure and intact coating layer contributed to significant corrosion resistance enhancement.