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Electromigration in Molten-phase Ge2Sb2Te5 and Effects of Doping on Atomic Migration Rate
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  • Electromigration in Molten-phase Ge2Sb2Te5 and Effects of Doping on Atomic Migration Rate
  • Electromigration in Molten-phase Ge2Sb2Te5 and Effects of Doping on Atomic Migration Rate
저자명
Joo. Young-Chang,Yang. Tae-Youl,Cho. Ju-Young,Park. Yong-Jin
간행물명
한국세라믹학회지
권/호정보
2012년|49권 1호|pp.43-47 (5 pages)
발행정보
한국세라믹학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
서지반출

기타언어초록

Electromigration in molten $Ge_2Sb_2Te_5$ (GST) was characterized using pulsed DC stress to an isolated line structure. When an electrical pulse was applied to the GST, GST lines were melted by Joule heating, and Ge and Sb atoms migrate to the cathode, whereas Te atoms migrate to the anode. This elemental separation in the molten GST was caused by an electrostatic force-induced electromigration. The effects of O-, N-, and Bi-doping on the electromigration were also investigated, and atomic mobility changes by the doping were investigated by quantifying $DZ^*$ values. The Bi -doping did not affect the $DZ^*$ values of the constituent atoms in the molten GST, but the D$DZ^*$ values decreased by O-doping and N-doping.