- Ag의 두께에 따른 비정질 As-Ge-Se-S의 홀로그래픽 특성연구
- ㆍ 저자명
- 김충혁,Kim. Chung-Hyeok
- ㆍ 간행물명
- 전기전자재료학회논문지
- ㆍ 권/호정보
- 2012년|25권 3호|pp.213-217 (5 pages)
- ㆍ 발행정보
- 한국전기전자재료학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
In this study, we have investigated the holographic grating formation on Ag-doped amorphous As-Ge-Se-S thin films. The dependence of diffraction efficiency as afunction of Ag layer thickness has been investigated in this amorphous chalcogenide films. Holographic gratings was formed using [P:P] polarized Diode Pumped Solid State laser (DPSS, 532.0 nm). The diffraction efficiency was obtained by +1st order intensity. The results were shown that the diffraction efficiency of Ag/AsGeSeS double layer thin films for the Ag thickness, the maximum grating diffraction efficiency using 60 nm Ag layer is 0.96%.